Since 2000, the luminous efficiency of LEDs has increased substantially at an annual rate of 10 to 20 lm/W. In recent years, the development of semiconductor lighting technology has been more and more rapid, and the speed of technological innovation has far exceeded expectations. The giant companies accelerated their attack and the industrial technology improved rapidly. In May 2011, Cree announced that its white LED light efficiency laboratory data reached 231 lm/W, creating a new global record. In 2011, the highest light efficiency of the product of Cree has reached 161lm/W.
In addition, in the field of epitaxial wafer production technology, Philips in the Netherlands took the lead in mass production of 150 mm epitaxial wafers at the end of 2010. In the field of LED lighting applications, General Electric Company of the United States took the lead in making breakthroughs in heat dissipation technology, which is a milestone for industrial development.
In terms of patents, the global LED high-end product market and patents, especially the core patent technology, are basically controlled by five major companies (Osram, Cree, Nichia, Toyota Synthetic and Philips). The major LED giants have reached a patent exchange agreement with each other to form a patent exchange network to consolidate the monopoly position.
At present, many LED companies in China have mastered low-power chip technology, and high-power chips have reached the research and development level of 110lm/w, but the enterprises that can mass-produce are a minority. At present, domestically produced chips have made breakthroughs in lighting applications through small chip integration, but the market share of high-power high-power lighting chips is still low, and more than 80 are imported. MOCVD equipment is still completely dependent on imports. At present, core technologies, patents and standards are still the main constraints on the development of China's semiconductor lighting industry.
Shanghai LED companies focus on R&D and have certain leading advantages in China. Mainly in: First, the substrate: sapphire, SiC substrate substrate has established a 2-inch substrate cutting, grinding, polishing preparation pilot production line, other substrates have been patented, such as lithium aluminate substrate . The second is the research and development of high-brightness chip technology: Shanghai Blu-ray and Shanghai Lanbao's 863 project acceptance indicators are among the top three in China, and the 863 Phase I and Phase II projects are the largest in Shanghai. Third, equipment: Shanghai, as an important base for China's advanced manufacturing industry, has a group of international top-level pipeline, gas, control and other semiconductor manufacturing equipment professional service companies, providing strong support for MOCVD equipment R & D and manufacturing. Fourth, LED lighting supporting technology research and development: Shanghai has a large number of research and development advantages in optical road design, precision optics, and special applications.
However, compared with the advanced level in foreign countries, the gap between Shanghai is still relatively large, and the quality of patents applied by local enterprises needs to be improved; most of the high-quality high-power LED chips used by local high-end lighting manufacturers are still imported, and most enterprises develop The equipment produced has not yet been put into practical use in Shanghai.
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